发明名称 ROTARY DEVICE AND METHOD FOR VAPOR PHASE GROWTH
摘要 PROBLEM TO BE SOLVED: To improve the embeddability in a trench. SOLUTION: A substrate 1 to be treated is set on a stage 2 in a reaction chamber 3 and the stage 2 is rotated at a prescribed rotating speed. In the middle of a reactive gas supplying pipeline 14, a control valve 15 is provided and starts and stops (or controls) the supply of a reactive gas to the reaction chamber 3. A valve controller 21 which controls the valve 15 is constituted of a storing section, valve drive control section, etc. In the storing section, a program in which the supplying pattern of the reactive gas is set is registered for intermittently supplying the reactive gas to the reaction chamber 3 (or repeatedly changing the flow rate of the gas). The valve drive control section controls the valve 15 by sending on/off (or flow rate control) signals to the valve 15 based on the program registered in the storing section.
申请公布号 JP2000058527(A) 申请公布日期 2000.02.25
申请号 JP19980221815 申请日期 1998.08.05
申请人 TOSHIBA MACH CO LTD 发明人 FUKUYAMA SATOSHI;ASANOME YUTAKA
分类号 H01L21/205;H01L21/31;(IPC1-7):H01L21/31 主分类号 H01L21/205
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