发明名称 DEVELOPING DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a developing device capable of preventing generation of any blot caused by adhesion of water drop during developing process, and of improving quality of a cathode-ray tube. SOLUTION: A cleaning portion 300 is provided with a holding portion 304 for holding a plurality of washing nozzles 302 in a region having rectangular shape in plane view. A plurality of washing nozzles constituting a first nozzle group 312 are arranged in a place at which high pressure water injected from these washing nozzles arrive in the central part of a face surface 202, and a plurality of washing nozzles constituting a second nozzle group 314 are arranged in a place at which high pressure water injected from these washing nozzles arrive in the peripheral part of the face surface 202. The plurality of washing nozzles 302 constituting the first and second nozzle groups are arranged so that high pressure water injected from these directly hit the entire face surface 202. Arrangement interval and injection amount of the washing nozzles are set so that interference between water films generated by hit of high pressure water injected from these washing nozzles onto the face surface is minimum.
申请公布号 JP2000057947(A) 申请公布日期 2000.02.25
申请号 JP19980224128 申请日期 1998.08.07
申请人 SONY CORP 发明人 KAWAMURA HIROAKI;SATOU TATSUYA
分类号 H01J9/227;(IPC1-7):H01J9/227 主分类号 H01J9/227
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