| 摘要 |
PURPOSE: A pattern forming method is provided, which suits the manufacture of a liquid crystal display (LCD) or a plasma display panel (PDP). CONSTITUTION: The pattern forming method comprises the step of: forming a pattern using a positive type resist compound including an alkali soluble phenol resin and a naphthoquinone diazide sulfonate ester and a recycle developer, wherein alkali soluble phenol resin is obtained by a reaction of a phenol type and an aldehyde type including a p-cresol over 50 weight percent and the naphthoquinone diazide sulfonate ester is a 1,2-naphthoquinone diazide-5-sulfonate ester, and the polyhydroxyl benzo phenone is a 2,3,4-trihydroxyl benzo phenone or a 2,3,4,4'-tetrahydroxyl benzo phenone. Thereby, it is possible to obtain an excellent pattern which a wire width is small and suitably use as a positive type resist compound for manufacturing a display. |
