| 摘要 |
PROBLEM TO BE SOLVED: To eliminate contaminants at an inexpensive operating cost by simultaneously removing silicon oxide and metallic contaminants from the surface of a substrate, by introducingβ-diketone,β-diketoimine, or an oxygen-containing compound expressed by a specific structural formula which makes similar chemical reaction together with hydrogen fluoride anhydride. SOLUTION: Silicon oxide is removed from the surface of a substrate by introducingβ-diketoneβ-diketoimine, or an oxygen-bearing compound expressed by the formula (where, R1 and R3 are each independently a straight-chain or branched fluorinated and nonfluorinated 1-8C alkyl group, alkenyl group, etc., and R2 is a straight-chain or branched nonfluorinated 1-8C alkyl group or alkenyl group, and Y is selected from oxygen atom or N-R4 where R4 is a nonfluorinated 1-10C alkyl group, aryl group, etc.), which makes similar chemical action together with a hydrogen fluoride anhydride and, in addition, metallic contaminants on the surface of the substrate are removed after chelating the contaminants.
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