发明名称 THERMAL TREATMENT METHOD AND THERMAL TREATMENT EQUIPMENT
摘要 PROBLEM TO BE SOLVED: To restrain sticking of reaction by-product and deposit in regions other than a treatment region. SOLUTION: In this thermal treatment method, an object W to be treated is accommodated in a treatment region in a treatment vessel 2 and thermally treated by using specified treating gas at a treating temperature under a treating pressure. In this case, in order to restrain sticking of reaction by-product and deposit in regions other than treatment region in the treatment vessel 2, pressures of the regions except the treatment region are set lower than a treating pressure of the treatment region.
申请公布号 JP2000058459(A) 申请公布日期 2000.02.25
申请号 JP19980225493 申请日期 1998.08.10
申请人 TOKYO ELECTRON LTD 发明人 YAMAMOTO HIROYUKI
分类号 C23C16/44;H01L21/205;H01L21/22;(IPC1-7):H01L21/205 主分类号 C23C16/44
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