INSULATING FILM FOR THIN-FILM STRUCTURE

摘要

PROBLEM TO BE SOLVED: To provide an insulating film for thin-film structure, which has good resistance against cracking. SOLUTION: An insulating film for a thin-film structure is deposited on a glass board not substantially containing alkali metal consisting of alternately laid layers of aluminum oxide and titanium oxide and thereby an electroluminescence device is formed, wherein the insulating film is interposed as insulating layer between a fluorescent material and a dielectric substance layer. The ratio of the cumulated thickness of titanium oxide to the cumulated thickness of aluminum oxide in this insulating layer lies below 0.75.