| 摘要 |
PROBLEM TO BE SOLVED: To provide a compact aligner for exposing a pattern plotted at the edge side of a mask to a substrate. SOLUTION: A mask and a photosensitive substrate 3 are synchronously moved to plural parallel optical paths, and the image of the mask is projected to transfer regions P1-P5 on the photosensitive substrate 3 with an exposing light from each optical path. In this case, a transfer region setting part 17 for variably setting the transfer regions P1-P5 by changing the projection region of the exposing light is arranged on each optical path.
|
