| 摘要 |
PURPOSE: A development apparatus is provided to perform a required development processing by suppressing a deterioration of a developing solution. CONSTITUTION: The development apparatus comprises: a nozzle(69) for outputting a developing solution to a surface of a substrate; a cover(78) having an opening part which passes the developing solution outputted from the nozzle to the substrate surface; a member(90) for spouting an inactive gas in order to stop the developing solution outputted from the nozzle in the cover from circumstance in the cover, the nozzle being a spray nozzle; and a member(49) for collecting the developing solution outputted with regard to the substrate to then supply the collected developing solution to the nozzle again. |
