发明名称 TREATING UNIT AND TREATMENT UNIT STRUCTURE
摘要 PROBLEM TO BE SOLVED: To provide a treatment unit which can efficiently perform a series of treatments on a flat object to be treated, such as semiconductor wafer, glass substrate, etc., and assembly of them. SOLUTION: The columnar space of a treatment unit is divided into four small spaces S1, S2, (S3), and S4, in such a state that their two side faces are brought into contact with the side faces of other spaces. In the spaces S1 and S2, treatment blocks 3 and 4 are respectively arranged, and in the space (S3), a robot (R) is set up. In the remaining space S4, in addition, a power unit 13, an exhaust duct 14, a return pipe 15 for clean air, and a multipurpose duct 16 for housing wires, etc., are arranged.
申请公布号 JP2000058617(A) 申请公布日期 2000.02.25
申请号 JP19980223928 申请日期 1998.08.07
申请人 TOKYO OHKA KOGYO CO LTD 发明人 AOKI TAIICHIRO;NAKAMURA AKIHIKO;TERAMOTO KAZUMA
分类号 H01L21/677;H01L21/02;H01L21/68;(IPC1-7):H01L21/68 主分类号 H01L21/677
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