发明名称 MANUFACTURE OF NITRIDE BASED III-V COMPOUND SEMICONDUCTOR
摘要 PROBLEM TO BE SOLVED: To manufacture nitride based III-V compound semiconductor in which non-luminescence center is few and crystallinity is superior. SOLUTION: In this method, a nitride based III-V compound semiconductor is manufactured by vapor deposition using material of a group III element, ammonia as material of group V element and hydrogen. Vapor phase mol. ratio (H2/(H2+NH3) of hydrogen to the total amount of hydrogen and ammonia is specified as 0.3<(H2/(H2+NH3)<0.7, 0.3<(H2/(H2+NH3)<0.6 or 0.4<(H2/(H2+NH3)<0.5.
申请公布号 JP2000058462(A) 申请公布日期 2000.02.25
申请号 JP19980229101 申请日期 1998.08.13
申请人 SONY CORP 发明人 HASHIMOTO SHIGEKI;YANASHIMA KATSUNORI;ASAZUMA YASUNORI;IKEDA MASAO
分类号 C30B25/02;H01L21/205;H01L33/32;H01S5/00;H01S5/323 主分类号 C30B25/02
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