| 摘要 |
PROBLEM TO BE SOLVED: To obtain a photosensitive resin composition capable of being treated under light safelight conditions and superior in sensitivity by incorporating a specified benzopyyromethene compound photosensitizer in the photosensitive resin composition and making the absorbance of a nonexposed film formed from this composition to a specified value or less in the specified region of the maximum wavelength of the safelight. SOLUTION: This positive visible light sensitive resin composition is used under the environment irradiated with safelight high in a relative luminosity factor having a maximum wavelength selected from the region of 1,500-620 nm. This composition contains a positive visible light sensitive resin and a photosensitizer of a benzopyyromethene compound represented by formula and the absorbance of a nonexposed film formed from this composition is made to <=0.5 in the region of the maximum wavelength of the safelight, ±30 nm. In the formula, each of R1-R3 and R5-R9 is, independently, an H or halogen atom or a nitro, cyano, or hydroxy group or the like; R4 is an H atom or a cyano group or the like and each of R10 and R11 is, independently, a halogen atom or an alkyl group or the like. |
