发明名称 |
PROCESSING LIQUID SUPPLYING NOZZLE AND SUPPLYING UNIT |
摘要 |
PROBLEM TO BE SOLVED: To suppress processing liquid in a processing liquid tank from bubbling or scattering. SOLUTION: A chemical introduction pipe 16 penetrating the side wall of the body 11 of a chemical tank 10 introduces chemical at a position higher than the upper limit UL of the liquid level of chemical. A processing liquid supply nozzle N1 is fixed to the forward end of the chemical introduction pipe 16. The processing liquid supply nozzle N1 has substantially tubular shape and receives chemical from the chemical introduction pipe 16 through an inlet made in one end plate and then damping the chemical flow by bringing it into collision against the other end plate. The chemical standing in the drum part of the processing liquid supply nozzle N1 drops naturally from an outlet 35 made at the lowermost part.
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申请公布号 |
JP2000058499(A) |
申请公布日期 |
2000.02.25 |
申请号 |
JP19980223189 |
申请日期 |
1998.08.06 |
申请人 |
DAINIPPON SCREEN MFG CO LTD |
发明人 |
NISHIDE NOBUHIKO |
分类号 |
H01L21/306;H01L21/304;(IPC1-7):H01L21/306 |
主分类号 |
H01L21/306 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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