| 摘要 |
PROBLEM TO BE SOLVED: To provide electron beam transfer equipment which can reduce defocusing due to space charge effect and can form a pattern with higher accuracy and high throughput. SOLUTION: This electron beam transfer equipment is provided with an illumination optical system which illuminates a reticle 12 having a pattern to be transferred on a wafer 16 with electron beam, and a projection optical system which projects an electron beam which passes the reticle 12 and is patterned and forms an image on the wafer 16. A forming aperture 8, which forms the sectional surface of the electron beam in a ring type, is arranged in the illumination optical system, and the reticle 12 is illuminated with a crossover image of the beam which is formed in the ring type.
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