SEMICONDUCTOR INTEGRATED CIRCUIT AND METHOD FOR DESIGNING SEMICONDUCTOR INTEGRATED CIRCUIT

摘要

PROBLEM TO BE SOLVED: To make it possible to decrease the errors of correction work after mask layout design of semiconductor integrated circuits and to execute the circuit correction after the mask layout design with the fewest possible number of masks. SOLUTION: This method has a space area search stage 1102 for searching regions not used for wiring of the respective wiring layers of the semiconductor integrated circuits, a wiring direction input stage 1103 for inputting the directions of wiring patterns generated in the respective wiring layers of the semiconductor integrated circuits, a wiring pattern generation stage 1104 for generating the wiring patterns in the generation inputted from the wiring direction input stage 1103 in the space areas searched by the space area search stage 1102 and a mask layout design stage 1106 for designing the mask layout of the semiconductor integrated circuits.