SURFACE STATE MEASUREMENT METHOD AND DEVICE

摘要

PROBLEM TO BE SOLVED: To measure surface state at a manufacturing site by analyzing infrared rays being emitted after multiple reflection in a substrate to be measured and measuring a contaminant on a surface. SOLUTION: Infrared rays being applied to an infrared ray condensation means 30 are reflected by a reflection plate 32 and a concave mirror 34 and are applied at an elliptical focus along the outer periphery of a substrate 12 to be measured. Infrared rays being introduced into the substrate 12 to be measured repeats internal reflection and at the same time accumulates the contamination information on the surface of the substrate 12 for probing, and is emitted from a position that is symmetrical to an incidence point. The infrared rays are dispersed by a spectroscope 52, are detected by an infrared detector 50, and are displayed as absorption spectra. Then, the spectra are analyzed by referring to the database of a computer 60 for control/analysis and the type and amount of an organic contamination substance are specified. In this manner, an output signal from the infrared detector 50 is analyzed by the computer 60, and the analysis result is displayed on a display 70.