发明名称 |
SEMICONDUCTOR MEMORY DEVICE AND MANUFACTURING METHOD THEREOF |
摘要 |
PURPOSE: A semiconductor memory device is provided to promote the slimming of a memory cell and to make fine the contacting with the upper layer wiring. CONSTITUTION: An SRAM comprises: a first conductive layer(16a) which is the gate electrode of a first load transistor(Q6) and a first driver transistor(Q4); a second conductive layer(16b) which is diverged from the first conductive layer on a field oxidization area and electrically connected with a second driver transistor activation area; and a third conductive layer(16c) which is the gate electrode of a second load transistor and a second driver transistor and electrically connected with the first load transistor activation area. Herein, the width of the second conductive layer which is placed on the field oxidization area is smaller than one of the first conductive layer.
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申请公布号 |
KR20000011974(A) |
申请公布日期 |
2000.02.25 |
申请号 |
KR19990030356 |
申请日期 |
1999.07.26 |
申请人 |
SEIKO EPSON CORPORATION |
发明人 |
KARASAWA JUNICHI;KUMAKAI TAKASHI;TANAKA KAZUO;WATANABE KUNIO |
分类号 |
H01L21/8244;H01L27/11;(IPC1-7):H01L27/11 |
主分类号 |
H01L21/8244 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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