METHOD AND APPARATUS FOR MEASURING PLASMA DENSITY INFORMATION AND PROBE

摘要

PURPOSE: A method and apparatus for measuring plasma density information and probe used for the method in a plasma used in a thin-film manufacturing process, a particle beam source or an analysis apparatus are provided to measure a plasma density information simply in a long term. CONSTITUTION: A plasma density information measuring apparatus consists of a measuring probe(12) installed on the wall of chamber(1) and a probe control unit(13) installed on the exterior of a chamber(1). The measuring probe(12) comprises:a dielectric tube(14) of which the internal layer is sealed and the external layer is opened to the ambient air; a loop antenna(15) which radiates high frequency power; a coaxial cable(16) which is connected to the loop antenna(15) and transmits high frequency power to the loop antenna(15); and an aluminum conductor chip(17) which prevents a leakage of released electronic wave.