发明名称 CONTROL METHOD OF HIGH FREQUENCY POWER FOR PLASMA GENERATION AND PLASMA GENERATION APPARATUS
摘要 PURPOSE: The apparatus can control the plasma density easily and appropriately for long time. CONSTITUTION: A plasma density information extraction part(11) of long life and thermal filamentless type is installed apart from a high frequency power supplying part for plasma generation. The plasma density information extraction part supplies the high frequency power for measurement to the plasma by intervening a dielectric tube, and acquires the plasma density information by measuring the physical constant relating with the reflection and the absorption of the high frequency power. The apparatus controls the plasma generation high frequency power outputted from a high frequency power source(8) by changing an impedance matching unit(10) according to the comparison result between the measured plasma density and the set plasma density and by adjusting the impedance matching state between the power source and the plasma.
申请公布号 KR20000011806(A) 申请公布日期 2000.02.25
申请号 KR19990029080 申请日期 1999.07.19
申请人 THE PRESIDENT OF NAGOYA UNIVERSITY;NISSIN INC. 发明人 SGAIHIDEO;TAKASGASEIICHI;TOYODANAOKI
分类号 H01L21/302;C23C16/52;H01J37/32;H01L21/3065;H05H1/00;H05H1/24;H05H1/46;(IPC1-7):H05H1/24 主分类号 H01L21/302
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