| 摘要 |
PURPOSE: An apparatus for exposing a charged particle beam is provided, which suitably operates a deflecting/scanning means and writing a pattern on a wafer. CONSTITUTION: The apparatus for exposing a charged particle beam comprises: a clock generator (47) for generating an operation processing clock, which an entire charged particle beam exposing apparatus is operated; a pattern data amending controller (64) for performing an amending operation process on an exposing pattern data according a column characteristic corresponding to the operation processing clock, including an amending operation process block for providing a last amending data to a deflecting/scanning means, and a data process block for computing an operation processing time corresponding to an exposing process period based on an exposing time amending value; and a maximum value detector (65) for detecting a maximum value between operation process times computed by the data process block. Thereby, it is possible to obtain a suitable exposing and increase the operation amount.
|
