| 摘要 |
PROBLEM TO BE SOLVED: To form a surface treated film constituted of hydrophobic surface treatment agent into a monomolecular film on a semiconductor substrate. SOLUTION: In this method for forming a surface treated film, a surface treated film 2 is formed on a semiconductor substrate 1 by applying hydrophobic surface treatment agent to the semiconductor substrate 1, and a surface treated film absorbing materials 15 whose surface is hydrophilic is allowed to act on the surface treated film 2, and the surface treated film absorbing materials 15 are separated from the surface treated film 2 on the semiconductor substrate 1. Thus, a monomolecular film constituted of the hydrophobic surface treatment agent can be formed on the semiconductor substrate 1. |
