| 摘要 |
PROBLEM TO BE SOLVED: To suppress the clogging of a discharging means which discharges a treating liquid to substrates. SOLUTION: An etching unit is provided with a chamber 1, a spray pipe 10, a tank 50, a supply pipeline 60, a pump 61, a return pipeline 70, a valve 71, and a filter 62. The chamber 1 houses a substrate W and the spray pipe 10 discharges a liquid chemical to the substrate W housed in the chamber 1. The tank 50 stores the liquid chemical discharged to the substrate W and the supply pipeline 60 connects the tank 50 to the spray pipe 10. The pump 61 sends the liquid chemical in the tank 50 to the spray pipe 10 and the return pipeline 70 can return the liquid chemical to the tank 50 from the spray pipe 70 and is connected to the pipe 10. The valve 71 is connected to the return pipeline 70 and the filter 62 filtrates the liquid chemical.
|
