SYSTEM FOR MANUFACTURING SEMI-CUSTOM RETICLE FOR MANUFACTURING INTEGRATED CIRCUIT AND METHOD THEREOF

摘要

PURPOSE: A system for manufacturing the semi-custom reticle is provided to remarkably shorten the manufacture time of the reticle compared with the reticle manufacture by the provision of an electric beam and the like. CONSTITUTION: The system for manufacturing the semi-custom reticle for the IC includes; a library(210) of the reticle primitive including at least two reticle primitive having patterns corresponding to specific parts of a layer to be formed by the semi-custom reticle; and an exposing device(230) forming images of the patterns on the semi-custom reticle by using at least two reticle primitive so the semi-custom reticle as to form the layer in a single lithography process(250).