发明名称 OBSERVING METHOD USING FOCUSED ION BEAM AND DEVICE THEREOF
摘要 PURPOSE: A method for preventing the damage on the surface of a sample is provided when irradiating with the ion beam to obtain the SIM image. CONSTITUTION: The method for obtaining the observed image by a scanning ion microscope(SMI) is composed of the steps of: generating the vacuum circumstance by exhausting the air inside of a sampling chamber to outside; driving a thermostat(14) to heat a reservoir(13); evaporating water by separating the contained water from the hydrate salt in the reservoir(13); injecting the evaporated vapor to the surface of a sample through a gas outlet(8) when a valve(17) is opened.
申请公布号 KR20000012004(A) 申请公布日期 2000.02.25
申请号 KR19990030563 申请日期 1999.07.27
申请人 SEIKO INSTRUMENTS INC. 发明人 AITA KAZUO;SUKIYAMA YASUHIKO
分类号 G01N23/225;G01Q30/08;G03F1/08;G03F1/72;G03F1/74;H01J37/28;H01J37/30;H01J37/317;H01L21/027;H01L21/66;(IPC1-7):H01L21/66 主分类号 G01N23/225
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