发明名称 |
OBSERVING METHOD USING FOCUSED ION BEAM AND DEVICE THEREOF |
摘要 |
PURPOSE: A method for preventing the damage on the surface of a sample is provided when irradiating with the ion beam to obtain the SIM image. CONSTITUTION: The method for obtaining the observed image by a scanning ion microscope(SMI) is composed of the steps of: generating the vacuum circumstance by exhausting the air inside of a sampling chamber to outside; driving a thermostat(14) to heat a reservoir(13); evaporating water by separating the contained water from the hydrate salt in the reservoir(13); injecting the evaporated vapor to the surface of a sample through a gas outlet(8) when a valve(17) is opened. |
申请公布号 |
KR20000012004(A) |
申请公布日期 |
2000.02.25 |
申请号 |
KR19990030563 |
申请日期 |
1999.07.27 |
申请人 |
SEIKO INSTRUMENTS INC. |
发明人 |
AITA KAZUO;SUKIYAMA YASUHIKO |
分类号 |
G01N23/225;G01Q30/08;G03F1/08;G03F1/72;G03F1/74;H01J37/28;H01J37/30;H01J37/317;H01L21/027;H01L21/66;(IPC1-7):H01L21/66 |
主分类号 |
G01N23/225 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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