摘要 |
A semiconductor device in which at least one lower electrode is formed on an insulating film formed on a semiconductor substrate, and a capacitive insulating film and an upper electrode are formed on a surface of said lower electrode, thereby forming a capacitive element, wherein said lower electrode has side walls each formed integrally on a side surface thereof and consisting of a conductive film whose lower end portion extends from a bottom surface of said lower electrode to a semiconductor substrate side.
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