发明名称 CHEMICAL POLISHING SOLUTION FOR ALUMINUM-BASED METAL AND CHEMICAL POLISHING METHOD
摘要 PROBLEM TO BE SOLVED: To chemically polish the surface of an Al-base metal without using phosphoric acid, nitric acid and their salts and without causing environmental pollution by using an aq. soln. highly alkalified with an alkali hydroxide and contg. a coating forming agent as an additive. SOLUTION: One or more additives are added to a highly alkaline aq. soln. of an alkali hydroxide, preferably sodium hydroxide or potassium hydroxide having about 0.2-2.0 mol/l concn. to prepare the objective chemical polishing soln. An Al-base metal freed of sticking fats and oils with a dilute alkaline aq. soln. is immersed in the chemical polishing soln. to polish the surface of the metal. The additives include a coating forming agent which forms a solid coating on the surface of the metal. A solid coating 4 is thinly formed on the fine protrusions 1 of the surface of the metal and thickly formed on the fine recesses 2, the fine protrusions 1 are selectively etched with a viscous thick coating 3 near the surface and the surface is made flat. The coating forming agent is preferably an oxidizing agent, silicates or borates.
申请公布号 JP2000054166(A) 申请公布日期 2000.02.22
申请号 JP19980220572 申请日期 1998.08.04
申请人 DENKA HIMAKU KOGYO KK 发明人 MATSUMOTO MASAOMI;SHINDO EMI;YOSHIDA AKIRA
分类号 C23F1/20;(IPC1-7):C23F1/20 主分类号 C23F1/20
代理机构 代理人
主权项
地址