| 摘要 |
PROBLEM TO BE SOLVED: To provide a surface treating device capable of uniformly subjecting a substrate of a large area to plasma treatment at a high speed, and moreover, reducing ion damage and capable of finishing it to a product of high quality. SOLUTION: Casing (2) is partitioned into two chambers of a plasma generating chamber (3) provided with a plasma generating electrodes (5 and 5') and a substrate treating chamber (4) provided with a substrate supporting stand (7). Plural plasma blow-off ports (6) are formed on the electrode (5') composing the bulkhead between the chambers (3 and 4). Moreover, on the substrate treating chamber (4), the substrate supporting stand (7) is arranged in such a manner that a substrate (S) is supported parallel to the flows of plasma from the plasma blow-off ports (6). The substrate supporting stand (7) is movable in the horizontal direction orthogonal to the blow-off direction of the plasma in a state in which the parallel interval with the blow-off direction of the plasma is held.
|
