| 摘要 |
PROBLEM TO BE SOLVED: To obtain a resin compsn. which is excellent in both heat resistance and process stability by compounding a synthetic resin with a specified amt. of a phenol compd. which has a nuclear substituent having a thioether structure. SOLUTION: This compsn. is prepd. by compounding 100 pts.wt. synthetic resin with 0.001-10 pts.wt. trinuclear phenol compd. of formula I (e.g. a compd. of formula I). If necessary, the compsn. further contains 0.01-10 pts.wt. other phenolic antioxidant (e.g. 2,6-di-t-butyl p-cresol), 0.001-10 pts.wt. phosphorus antioxidant (e.g. triphenylphosphite), 0.001-10 pts.wt. thioether antioxidant (e.g. lauryl thiodipropionate), an ultraviolet absorber, a hinderd amine light stabilizer, a nucleating agent, etc. In formula II, R1 is H or a 1-8C alkyl; R2 is H or a 1-4C alkyl; R3 is an alkanetriyl, an arom, hydrocarbon group having 3 alkylene groups, or an isocyanuric acid group having 8 N-alkylene groups; and n is an integer of 1-30.
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