发明名称 GAS SHOWER DEVICE FOR FILM FORMING DEVICE
摘要 PROBLEM TO BE SOLVED: To lower the cost by facilitating the maintenance of a device by forming a diffusion part for diffusing a reaction gas and a guide part guiding the diffused gas on the surface of a substrate separately and enabling them to be exchanged individually. SOLUTION: The gas shower device is constituted so as to form a lower side diffusion part and upper side guide part separately, which are matched with each other in the up and down direction to be combined. The lower side diffusion part is formed by laminating plural plates 7, holding both ends between end plates and joining with through bolts, each plate 7 has recessed parts 7a and plural grooves 7c each extending upward from the recessed part 7a and a through hole 7d formed in each recessed part 7a is connected to a reaction gas feed pipe. The upper side guide part is formed by laminating plural plates 9 and a thin part 9a running through up and down is provided on each plate 9. In the shower device, at the time of depositing a reaction product, the reaction product is deposited only on the upper side guide part and the cleaning is performed by detaching only the upper side guide part without a fear of damaging the function.
申请公布号 JP2000054138(A) 申请公布日期 2000.02.22
申请号 JP19980217163 申请日期 1998.07.31
申请人 HITACHI LTD;HITACHI TOKYO ELECTRONICS CO LTD;CANON SALES CO INC 发明人 FUKADA HIROSHI;SAKA SOICHIRO;SHIDA HIROYUKI;OKAZAKI HISAO;ISHII YUUKI
分类号 C23C14/24;C23C14/34;C23C16/44;C23C16/455;H01L21/205;H01L21/31;(IPC1-7):C23C16/455 主分类号 C23C14/24
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