发明名称 |
FILM STRUCTURE EXCELLENT IN HEAT AND WEAR RESISTANCE |
摘要 |
PROBLEM TO BE SOLVED: To suppress the generation of iron oxide on a nitride film formed by cathode arc type ion plating in a hot environment and to obtain a film structure having enhanced heat and wear resistances. SOLUTION: A TiAlN film is formed in 2-7μm thickness on a nitride film formed by cathode arc type ion plating. An oxide film of 2-20μm thickness comprising MgO, Al2O3 or ZrO2 is formed on a nitride film formed by cathode arc type ion plating and a TiAlN film is further formed in 2-7μm thickness on the oxide film. An oxide film of 2-20μm thickness comprising MgO, Al2O3 or ZrO2 is formed on a nitride film formed by cathode arc type ion plating, a TiAlN film is further formed in 2-5μm thickness on the oxide film and a silicate film is further formed on the TiAlN film by a sol-gel process.
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申请公布号 |
JP2000054114(A) |
申请公布日期 |
2000.02.22 |
申请号 |
JP19980223226 |
申请日期 |
1998.08.06 |
申请人 |
SUMITOMO METAL MINING CO LTD |
发明人 |
KITAGAWA NAOAKI;OKABE SHINICHI |
分类号 |
B23B27/14;B23P15/28;C23C14/06;(IPC1-7):C23C14/06 |
主分类号 |
B23B27/14 |
代理机构 |
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代理人 |
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地址 |
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