发明名称 FILM STRUCTURE EXCELLENT IN HEAT AND WEAR RESISTANCE
摘要 PROBLEM TO BE SOLVED: To suppress the generation of iron oxide on a nitride film formed by cathode arc type ion plating in a hot environment and to obtain a film structure having enhanced heat and wear resistances. SOLUTION: A TiAlN film is formed in 2-7μm thickness on a nitride film formed by cathode arc type ion plating. An oxide film of 2-20μm thickness comprising MgO, Al2O3 or ZrO2 is formed on a nitride film formed by cathode arc type ion plating and a TiAlN film is further formed in 2-7μm thickness on the oxide film. An oxide film of 2-20μm thickness comprising MgO, Al2O3 or ZrO2 is formed on a nitride film formed by cathode arc type ion plating, a TiAlN film is further formed in 2-5μm thickness on the oxide film and a silicate film is further formed on the TiAlN film by a sol-gel process.
申请公布号 JP2000054114(A) 申请公布日期 2000.02.22
申请号 JP19980223226 申请日期 1998.08.06
申请人 SUMITOMO METAL MINING CO LTD 发明人 KITAGAWA NAOAKI;OKABE SHINICHI
分类号 B23B27/14;B23P15/28;C23C14/06;(IPC1-7):C23C14/06 主分类号 B23B27/14
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