发明名称 NEW ONIUM SALT AND RADIO SENSITIVE RESIN COMPOSITION CONTAINING THE SAME
摘要 PROBLEM TO BE SOLVED: To obtain the subject new compound useful as a chemically amplifying type resist. SOLUTION: This resist is a compound of formula I or formula II (R1 and R2 are each an aromatic organic group, an alkyl, a cycloalkyl or the like; R8-R10 are each an aromatic organic group, an alkyl, an aralkyl or the like; R3-R7 are each H, a halogen, nitro, a lower alkoxyl or the like; a total carbon number of R3-R7 is 4-7), e.g. 4-t-butylbenzene sulfonate di(4-t-butylphenyl) iodonium-4-t-butylbenzene sulfonate. The compound of formula I or formula II is obtained by reacting a corresponding specific sulfonic acid or its salt in an aqueous solution of an onium salt synthesized by a known method or in a solution of an organic solvent such as methanol, acetone or acetonitrile and exchanging the salt. The compound of formula I or formula II has a property generating an acid by being exposed with various radioactive rays such as ultraviolet rays or X-rays, excellent in solubility in a solvent and excellent in solubility with various resins.
申请公布号 JP2000053601(A) 申请公布日期 2000.02.22
申请号 JP19980224532 申请日期 1998.08.07
申请人 TOYO GOSEI KOGYO KK;MICRO CHEM CORP 发明人 SUZUKI YASUHIRO;ISHII SHINJI;DONALD W JOHNSON
分类号 G03F7/004;C07C25/02;C07C43/225;C07C309/28;C07C381/12;C07D327/06;C07D333/46;C07D333/50;C07D333/76;C07D335/02;C07D335/10;C08L101/02;G03F7/038;G03F7/039 主分类号 G03F7/004
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