| 摘要 |
PROBLEM TO BE SOLVED: To provide an antireflection film showing uniformly low reflectance in a wide wavelength region by forming a specified high refractive index layer under a low refractive index layer. SOLUTION: This antireflection film consists of a supporting body and a low refractive index layer which is formed by applying a compsn. containing a hydrolyzed organosilane and/or its partial condensate (to form a solgel film) on the supporting body. In this method, a high refractive index layer consisting of a photocation polymn. hardened film of a polyfunctional epoxy compd. having 50 to 200 nm film thickness and 1.70 to 2.20 refractive index is formed under the low refractive index layer. The organosilane represents a silane compd. having at least one functional group to which silanol is added by hydrolysis in the molecule, and it acts as a binder in the compsn. Thus, the desired antireflection film is obtd. by using the solgel film having a low refractive index and high strength as the material for the low refractive index layer of the uppermost layer and further using the epoxy binder layer having a high refractive index and excellent adhesion as a high refractive index layer under the first layer. |
