发明名称 FILM TRANSFER/RETOUCH DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a device capable of forming a micro pattern in a thermally press-adhering stage, also dispensing with a developing stage and performing film transfer/retouch with a small size laser. SOLUTION: In this device, a work 1 is placed on an X-Y table 2 and then, a retouching film 3 is pressed and contacts with the work 1 with a transparent pressure plate 5 and thereafter, the retouching film 3 is irradiated through an objective lens 4, with a laser beam from a laser light source 10 consisting of a continuous wave oscillation laser of the infrared region or a high-frequency pulse laser of >=500 Hz frequency, to heat the retouching film 3 so as to soften the retouching film 3 and thermally adhere it on the work. Thus, the film retouching can be performed by using a comparatively small size laser in a completely dry process and also, the retouching stage can be simplified.
申请公布号 JP2000047017(A) 申请公布日期 2000.02.18
申请号 JP19980212324 申请日期 1998.07.28
申请人 NTN CORP 发明人 ONDA HAJIME;KOIKE TAKASHI
分类号 G02B5/20;G02F1/1335;H01J9/20;H01J11/20;H01J11/44 主分类号 G02B5/20
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