发明名称 ELECTRODE PLATE IN PLASMA TREATMENT APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide an electrode plate in a plasma treatment apparatus for reducing a gap between a gas blowing hole of an electrode plate and a gas blowing hole of a plasma treatment apparatus, without damaging an inner face of the gas blowing hole when the electrode plate is mounted on the plasma treatment apparatus. SOLUTION: An electrode plate 1 in a plasma treatment apparatus has a plurality of gas blowing hole 2. A small hole 3 is provided at an outer boundary part of the electrode plate 1 for aligning a gas blowing hole 10 of the plasma treatment apparatus and the gas blowing hole 2 in the electrode plate 1.
申请公布号 JP2000049144(A) 申请公布日期 2000.02.18
申请号 JP19980212761 申请日期 1998.07.28
申请人 HITACHI CHEM CO LTD 发明人 NIHEI TORU
分类号 H05H1/46;C23F4/00;H01L21/205;H01L21/302;H01L21/3065 主分类号 H05H1/46
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