| 摘要 |
PROBLEM TO BE SOLVED: To obtain a positive type photosensitive compsn. having good sensitiv ity and resolution, giving a good resist pattern and exhibiting satisfactory dry etching resistance when a light source for exposure emitting light of <=250 nm, particularly <=220 nm wavelength is used by using a resin having a specified cycloaliphatic group. SOLUTION: The photosensitive compsn. contains a compd. which generates an acid when irradiated with activic rays of light or radiation and a resin contg. at least one of monovalent polycyclic cycloaliphatic groups of the formula and a group which is decomposed by the action of the acid and increases solubility in an alkali developer. In the formula, Ra-Rg may be the same or different and are each an alkyl which may have a substituent, a cycloalkyl which may have a substituent, an alkenyl which may have a substituent or an alkynyl which may have a substituent, a halogen, cyano, -R6-O-R7, -R8-CO-O-R9 or the like, R7 and R9 are each H, an alkyl or the like and R6 and R8 are each a single bond, alkylene or the like. |
