RADIATION-SENSITIVE COMPOSITION OF CHEMICAL AMPLIFICATION TYPE

摘要

A chemical amplification type radiation-sensitive composition comprising a film-forming resin based on a hydroxystyrene in combination with an onium salt precursor capable of generating a fluorinated alkanesulfonic acid as a radiation-sensitive acid-generating agent. This composition is free from the occurrence of corrosion of an apparatus owing to outgassing, the formation of a T-type pattern and the change of line width caused by a delay of processing time, and can be used for achieving a high sensitivity and resolving power and a good and stable pattern formation.