MEMORY DEVICE USING A TRANSISTOR AND ITS FABRICATION METHOD

摘要

The present invention provides a memory device by using a single transistor, comprising a circuit including a gate of a memory cell and a P type well substrate for inputting(writing) information and another circuit including a source and a drain for outputting(reading) information. In other word, the memory device includes an information input/output circuit by using a pair of respective read and write terminals. The transistor comprises a source, a drain, and a ferroelectric element gate which are formed in a P type (or N type) well substrate. And the present invention provides a fabrication method for manufacturing the memory circuit, comprising depositing the P type (or N type) well structure on a Si wafer and forming the source, the drain and then the gate in the P type (or N type) well structure.