发明名称 |
A SENSOR FOR MEASURING A SUBSTRATE TEMPERATURE |
摘要 |
A temperature sensor for measuring a temperature of a substrate in a thermal processing chamber is described. The chamber includes a reflector forming a reflecting cavity with a substrate when the substrate is positioned in the chamber. The temperature sensor includes a probe having an input end positioned to receive radiation from the reflecting cavity, and a detector optically coupled to an output end of the probe. The radiation entering the probe includes reflected radiation and non-reflected radiation. The detector measures an intensity of a first portion of the radiation entering the probe to generate a first intensity signal and measures an intensity of a second portion of the radiation entering the probe to generate a second intensity signal. The detector is configured so that a ratio of the reflected radiation to the non-reflected radiation is higher in the first portion than the second portion. The two intensity signals are used to calculate the temperature and emissivity of the substrate.
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申请公布号 |
WO0008429(A1) |
申请公布日期 |
2000.02.17 |
申请号 |
WO1999US17805 |
申请日期 |
1999.08.06 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
ADAMS, BRUCE;HUNTER, AARON;RUBINCHIK, ALEX;YAM, MARK;O'BRIEN, PAUL, A. |
分类号 |
G01J5/00;G01J5/02;G01J5/04;G01J5/08;G01J5/34;H01L21/26;H01L21/66;(IPC1-7):G01J5/00 |
主分类号 |
G01J5/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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