| 摘要 |
<p>PROBLEM TO BE SOLVED: To perform multiple exposure in a comparatively short time without attaching/detaching a mask by constituting the mask in such a way that two masks having the same pattern shape hold a mask having the pattern shape different from the two masks in between. SOLUTION: The mask is constituted in such a way that two masks having the same pattern shape hold the mask having the pattern shape different from the two masks in between. For example, the mask 223 is constituted by providing RM masks on the same plane while holding an FM mask in between. The FM mask is constituted of a cyclical pattern FMP obtained by cyclically arraying so fine patterns that they can not be resolved by ordinary projection exposure. The RM mask is constituted of an ordinary circuit pattern RMP consisting of line width which can be resolved by the projection exposure. Then, two of the masks, for example, the RM 1 mask and the FM mask are simultaneously projected and exposed on the surface of a wafer. At this time, the RM 1 mask and the FM mask are illuminated on different conditions by an illumination system.</p> |
