| 摘要 |
PROBLEM TO BE SOLVED: To provide a CoPt sputtering target, by which the formation of element distribution in the plane of the medium can be suppressed when it is used in the formation of film, the method for production of the same, and the magnet recording medium. SOLUTION: A CoPt sputtering target containing Co as a main component contains elements selected from Ni and the elements of groups IVa, Va and VIa in addition to Pt, and gives a X-ray diffraction pattern, wherein the diffraction peaks show that the elements in the target are each present as a substantially metallic element single form. The magnetic recording medium having little dispersion of the composition in the plane can be obtained by sputtering the target. The target is produced, e.g. by low-temp. sintering a compact composed of Co-powder, Pt-powder and elemental simple substances selected from Ni and the elements of groups IVa, Va and VIa at 400-1,000 deg.C.
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