发明名称 ION IMPLANTATION EQUIPMENT
摘要 PROBLEM TO BE SOLVED: To reduce labor and time required for operation in atmospheric release and evacuation, by specifying a source of dust generated in a vacuum chamber of ion implantation equipment. SOLUTION: Frame-shaped dust passing sensors A8 and B9 have a coordination system including X-axis sensors and Y-axis sensors, in which a plurality of segments made up of a laser generator and a CCD light receiving element are arranged in a line. These sensors A8 and B9 are installed in two positions at given intervals in a vacuum chamber 2. Each passing position of dust passing through each frame is detected from intensity of scattered light of an emitted laser beam that is reflected by the dust, and thereby a passing line passing two points is detected in the coordinate system. A crossing point between the dust passing line and an inner wall of the vacuum chamber is detected to specify a source of dust.
申请公布号 JP2000040670(A) 申请公布日期 2000.02.08
申请号 JP19980209097 申请日期 1998.07.24
申请人 NEC KYUSHU LTD 发明人 TSUTSUMI TATSUMOTO
分类号 G01N21/85;G01N21/88;G01N21/94;H01J37/317;H01L21/265;H01L21/66;(IPC1-7):H01L21/265 主分类号 G01N21/85
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