| 摘要 |
PROBLEM TO BE SOLVED: To provide a charged particle lithograph device capable of reducing aberration. SOLUTION: This lithograph device is equipped with a light emission system 7 for supplying projection beams of charged particles, a mask table 5 for holding a mask 29, a substrate table 1 for holding a substrate 19, and a projection system 3 for imaging an irradiated portion of the mask 29 on targeted portions 35 of the substrate 19. Here, the projection system 3 comprises at least three quadrupole lenses arranged in series in an orbit 25 of the beams.
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