发明名称 ION SOURCE
摘要 PROBLEM TO BE SOLVED: To obtain an ion source which prevents a gas from being adsorbed to an electron collector during the operation of the ion source and which is not influenced by electron simulated desorption(ESD). SOLUTION: In an ion source, an airtight vacuum chamber 5 which is maintained in a vacuum state is provided, an electron emitter 1 which is arranged inside the vacuum chamber 5 and which emits electrons into the vacuum chamber 5 is provided, an electron collector 2 which holds and moves the electrons emitted from the electron emitter 1 is provided, and an ion collector 3 which pulls out ions generated inside the vacuum chamber 5 is provided. In addition, a heating means which heats the electron collector 2 by a means other than an electron impact means is provided. A temperature rise at 600 deg.C or higher at which a gas emission due to the diffusion of a gas from the electron collector 2 is increased is prevented. A temperature range of 400 to 600 deg.C is set as a temperature range which can prevent the adsorption of gas molecules surely is set.
申请公布号 JP2000039375(A) 申请公布日期 2000.02.08
申请号 JP19980206115 申请日期 1998.07.22
申请人 SUKEGAWA ELECTRIC CO LTD;MUSASHINO ENG:KK 发明人 WATANABE FUMIO;MIYAMOTO KAZUO
分类号 G01L21/30;G01L21/34;G01N27/62;G01N27/68;H01J41/06;(IPC1-7):G01L21/30 主分类号 G01L21/30
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