发明名称 FORMATION OF METALLIC FILM AND ELECTRODE
摘要 PROBLEM TO BE SOLVED: To obtain a plated metallic film or a plated electrode on an inorganic substrate, which has excellent adherability to a inorganic substrate, by supplying a positive voltage to a metallic film plated on the inorganic substrate and supplying negative voltage to the inorganic substrate so as to generate a static attractive force at the interface between the metal film and the inorganic substrate. SOLUTION: A plated metallic film 2 of a metal such as Ni, Co, Cu, Zn, Cr or Fe or an alloy thereof is formed on an inorganic substrate 1 and then a negative voltage is applied to the inorganic substrate through an electrode 3 for supplying negative voltages and a positive voltage is supplied to the metallic film 2 plated on the inorganic substrate so as to generate static attractive force at the interface between the inorganic substrate 1 and the metallic film 2. There is no metal oxide at the interface between the inorganic substrate 1 and the metallic film 2 because the metallic film 2 is a metallic film plated on the inorganic substrate 1, thereby a sufficient adhesive force can be obtained by giving an accumulated charge of about 1/10,000-1/10 of the charge given in the anodic jointing method. By this method, it is possible to reduce the temp. of pre-heating or the temp. during jointing process, to shorten the cooling time after jointing and to improve the throughput.
申请公布号 JP2000038680(A) 申请公布日期 2000.02.08
申请号 JP19980208022 申请日期 1998.07.23
申请人 FUJITSU LTD 发明人 FUKUDA SHINYA;NAKATANI TADASHI;BETSUI KEIICHI;KASAHARA SHIGEO
分类号 C25D11/00;C23C18/31;C25D5/48;G09F9/30;H01J9/02;(IPC1-7):C23C18/31 主分类号 C25D11/00
代理机构 代理人
主权项
地址