| 摘要 |
PURPOSE: A method for shaping an embroidery pattern layer on a hat is provided to increase a cubic effect by forming a dual layered embroidery layer and to supply a fine exterior. CONSTITUTION: An embroidery layer of a hat is manufactured by:overlapping a first design material(4) on a fabric textile(2); performing a first cubic operation by using a sewing instrument for forming a first embroidery layer(10) containing the embedded first design material on the fabric textile; adhering the first embroidery layer in a certain location while locating a second design material(12) between the first embroidery layer and the fabric textile; and performing a second cubic operation by using the sewing instrument for forming a second embroidery layer(20) having a certain shape for forming a dual layered embroidery layer. Therefore, the embroidery layer being shaped on a certain location of the hat as an ornament or a trademark can be made into a single layer, a dual layer, a triple layer, and a multiple layer for satisfying an excellent cubic effect while presenting a fine exterior.
|
