ANNEALING APPARATUS OF SEMICONDUCTOR WAFER HAVING SIDE HEATING RAMP

摘要

PURPOSE: A semiconductor wafer annealing apparatus is provided to improve a uniformity of heat treatment of the wafer by heating sides of wafer using a side heating ramp. CONSTITUTION: The annealing apparatus comprises an upper heating ramp(4) for heating an upper surface of a wafer(2) loaded in an annealing chamber(1) by irradiating lights; and a side heating ramp(5) for heating both sides of the wafer(2) by irradiating lights. The wafer(2) is horizontally rotating by a spinner(3). The side heating ramp(5) is made of a pair of halogen ramp. The upper heating ramp(4) includes a plurality of unit ramps(6).