DIFFUSION FURNACE FOR SEMICONDUCTOR DEVICE FABRICATION

摘要

PURPOSE: A diffusion furnace is provided to fix a thermometer for measuring internal temperature of the diffusion furnace to an exact position therein by forming a position fix rib and a position fix protrusion. CONSTITUTION: The diffusion furnace comprises a furnace made of quartz; a thermometer protection tube fixed to the furnace; a protection rib having a protrusion inserting groove capable of receiving a position fix protrusion in an end of the thermometer protection tube partially protruded to the outside of the furnace; and a thermometer supporter having a position protection protrusion capable of being inserted into the protrusion inserting hole formed on a protection tube rib of the thermometer protection tube.