METHOD OF FABRICATING SEMICONDUCTOR DEVICE

摘要

PURPOSE: A wiring method is provided to form a conductive layer pattern for required wiring by attaining a photoresist layer pattern satisfying both a low step region and a high step region. CONSTITUTION: The method comprises the steps of sequentially forming an insulating layer and a conductive layer on a semiconductor substrate; forming a photoresist layer on the conductive layer; patterning the photoresist layer using a mask of which a mask pattern is relatively greater than a conductive layer pattern requiring to be formed on the semiconductor substrate in the high step region; and etching the conductive layer using the photoresist pattern as a mask to form a conductive pattern having a required size on the low and high step regions.