| 摘要 |
PURPOSE: A semiconductor vacuum equipment having a back-flow prevention valve is provided to suppress defective of a wafer and unnecessary cleaning of an vacuum equipment. CONSTITUTION: The equipment comprises a vacuum pump externally exhausting air in a process chamber through an exhausting hole, wherein the back-flow prevention valve preventing back-flow of external air is installed at the exhausting pipe of the vacuum pump and includes a supporting axis fixed to cross an internal path of the exhausting pipe, a left revolving wing blocking the internal path at the left of the supporting axis, a right revolving wing blocking the internal path at the right of the supporting axis, and a stopper fixed at a position wherein the right and the left revolving wings block the internal path during back-flow of the external air.
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