METHOD OF FABRICATING THERMAL DETECTOR DEVICE FOR INFRARED RAY CAMERA

摘要

PURPOSE: The method can reduce the unit cost of a product by substituting a photo detector used in the fabrication of an infrared ray camera with a thermal detector device without an expensive cooler. CONSTITUTION: The method comprises the processes of: forming a groove by etching a front side of a dielectric film; filling an etch stopper film in the groove; forming a first electrode(104), an infrared ray absorbing film(106) and a semi-transmission film(108) in sequence on the front side of the dielectric film including the etch stopper film; forming a dielectric pattern(100a) by grinding the back side of the dielectric film until the etch stopper film is revealed; forming a second electrode(110a) selectively only on the back side, and removing the etch stopper film in the groove; preparing a semiconductor chip(200) comprising a mesa isolation insulating film(202), and forming a metal line(204) on the top surface and one side of the isolation insulating film and on a region of the semiconductor chip; and performing the flip chip bonding between the metal line and the second electrode by intermediating an indium pump. The thermal detector device can be driven by a cooler of low cost enough to operate the dielectric film pattern.