发明名称 SEMICONDUCTOR MEMORY DEVICE AND FABRICATING METHOD THEREOF
摘要 PURPOSE: A semiconductor memory device is provided to prevent a bridge between storage electrodes by forming a conductive layer for a storage electrode to be thinner than a barrier film. CONSTITUTION: The device comprises a semiconductor substrate; an insulating layer electrically connected to the semiconductor substrate; a plug penetrating the insulating layer to be electrically connected to the semiconductor substrate; a first barrier film for a storage electrode formed on the plug and the insulating layer; a first conductive layer for a storage electrode formed on the first barrier film; a second barrier film formed on the first conductive layer; a thin second conductive layer formed on the second barrier film; a barrier metal spacer formed on both sidewalls of the second conductive layer, the second barrier film, the first conductive layer, and the first barrier film; a conductive layer spacer formed on both sidewalls of the barrier metal spacer.
申请公布号 KR20000007538(A) 申请公布日期 2000.02.07
申请号 KR19980026916 申请日期 1998.07.03
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 KWAK, DONG HWA;HWANG, YU SEONG;CHUNG, TAE YEONG
分类号 H01L27/108;H01L21/02;H01L21/8242;(IPC1-7):H01L27/108 主分类号 H01L27/108
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