发明名称 |
SEMICONDUCTOR MEMORY DEVICE AND FABRICATING METHOD THEREOF |
摘要 |
PURPOSE: A semiconductor memory device is provided to prevent a bridge between storage electrodes by forming a conductive layer for a storage electrode to be thinner than a barrier film. CONSTITUTION: The device comprises a semiconductor substrate; an insulating layer electrically connected to the semiconductor substrate; a plug penetrating the insulating layer to be electrically connected to the semiconductor substrate; a first barrier film for a storage electrode formed on the plug and the insulating layer; a first conductive layer for a storage electrode formed on the first barrier film; a second barrier film formed on the first conductive layer; a thin second conductive layer formed on the second barrier film; a barrier metal spacer formed on both sidewalls of the second conductive layer, the second barrier film, the first conductive layer, and the first barrier film; a conductive layer spacer formed on both sidewalls of the barrier metal spacer.
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申请公布号 |
KR20000007538(A) |
申请公布日期 |
2000.02.07 |
申请号 |
KR19980026916 |
申请日期 |
1998.07.03 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
KWAK, DONG HWA;HWANG, YU SEONG;CHUNG, TAE YEONG |
分类号 |
H01L27/108;H01L21/02;H01L21/8242;(IPC1-7):H01L27/108 |
主分类号 |
H01L27/108 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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